Zygo interferometer for measuring refractive index of photorefractive bismuth silicon oxide (Bi12SiO20) crystal

Optics and Laser Technology

Volumn 30, Issue 6, 1998, Pages 425-430

  Shukla, R P ^a   Udupa, D V ^a   Aggarwal, M D ^b  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

^b ALABAMA A AND M UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; BISMUTH COMPOUNDS; COMPUTER SOFTWARE; CRYSTAL STRUCTURE; CRYSTALS; HELIUM NEON LASERS; LASER BEAMS; MIRRORS; OPTICAL INSTRUMENT LENSES; PHOTOREFRACTIVE MATERIALS; REFRACTIVE INDEX; WAVEFRONTS;

BISMUTH SILICON OXIDE; INTERFEROGRAMS; OPTICAL PATH DIFFERENCE; PHASE SHIFTING ADAPTER; SETTING ACCURACY; ZYGO INTERFEROMETER;

INTERFEROMETERS;

EID: 0032268267     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-3992(98)00076-0     Document Type: Article

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