Mechanism of charging damage during interlevel oxide deposition in high-density plasma tools

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1998, Pages 164-167

  Hwang, Gyeong S ^a   Giapis, Konstantinos P ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRIC CURRENTS; MONTE CARLO METHODS;

HIGH-DENSITY PLASMA TOOLS; INTERLEVEL DIELECTRIC (ILD) DEPOSITION;

SEMICONDUCTING FILMS;

EID: 0032266287     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)