New analytic models and efficient parameter extraction for computationally efficient 1-D and 2-D ion implantation modeling

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1998, Pages 517-520

  Balamurugan, G ^a   Obradovic, B ^a   Wang, G ^a   Chen, Y ^a   Tasch, Al ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; ION IMPLANTATION; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING;

ION IMPLANTATION MODELS;

CMOS INTEGRATED CIRCUITS;

EID: 0032265926     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)