Development of stable PZT sputtering process using ex-situ crystallization and PZT/Pt interface control technique

IEEE International Symposium on Applications of Ferroelectrics

Volumn , Issue , 1998, Pages 159-162

  Yamakawa, K ^a   Arisumi, O ^a   Okuwada, K ^a   Tsutsumi, K ^a   Katata, T ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CRYSTALLIZATION; FERROELECTRIC MATERIALS; GRAIN SIZE AND SHAPE; LEAD COMPOUNDS; PEROVSKITE; PHASE TRANSITIONS; PLATINUM; SPUTTER DEPOSITION; SUBSTRATES;

SEEDING TECHNIQUES;

DIELECTRIC FILMS;

EID: 0032265057     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (3)