The effects of H 2 addition on the enhanced deposition rate and high quality Cu films by MOCVD

Journal of the Korean Physical Society

Volumn 33, Issue SUPPL. 2, 1998, Pages

  Lee, Jong Hyun ^a   Park, Byung Nam ^a   Park, Sang Jun ^b   Choi, Sie Young ^a  

^a Kyungpook National University   (South Korea)

^b Equipment Development Department

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032262935     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

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5. John A. T. Norman et al., Thin Solid Films 262, 46 (1995).
6. Nobuyoshi Awaya et al., Thin Solid Films 262, 12 (1995).
7. J. H. Lee et al., The 4th Semiconductor Conference Proceeding, p. 395.
8. S. Vaidya and A. K. Sinha, Thin Solid Films 75, 253 (1981).