Surface damage in III-V devices by dry etching

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1998, Pages 50-55

  Pang, S W ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; GATES (TRANSISTOR); HETEROJUNCTION BIPOLAR TRANSISTORS; IONS; PASSIVATION; PLASMA ETCHING; SEMICONDUCTOR QUANTUM WIRES;

IN-PLANE GATED (IPG) QUANTUM WIRE TRANSISTORS;

CRYSTAL DEFECTS;

EID: 0032255682     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)