Validation and verification of the simulation model of a photolithography process in semiconductor manufacturing

Winter Simulation Conference Proceedings

Volumn 2, Issue , 1998, Pages 1017-1022

  Nayani, Nirupama ^a   Mollaghasemi, Mansooreh ^a  

^a Cirent Semiconductor   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CLEAN ROOMS; PHOTOLITHOGRAPHY; PROCESS ENGINEERING; PRODUCTION ENGINEERING; SEMICONDUCTOR DEVICE MANUFACTURE;

MANUFACTURING SIMULATION MODEL;

COMPUTER SIMULATION;

EID: 0032255085     PISSN: 02750708     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)