Real-time observation of aluminum chemical vapor deposition in an environmental scanning electron microscope

Microscopy and Microanalysis

Volumn 4, Issue 5, 1998, Pages 497-503

  Linam, David L ^a,c   Drucker, Jeff ^b  

^a University of Texas at El Paso   (United States)

^b UNIVERSITY OF TEXAS AT EL PASO   (United States)

^c NONE   (United States)

Author keywords

Aluminum chemical vapor deposition; Chemical vapor deposition; Environmental scanning electron microscope; Microstructural evolution; Real time; Tri isobutyl aluminum

Indexed keywords

EID: 0032244994     PISSN: 14319276     EISSN: None     Source Type: Journal    
DOI: 10.1017/S1431927698980473     Document Type: Article

References (5)

1. Beach DB, Blum SE, LeGoues FK (1989) Chemical vapor deposition of aluminum from trimethylamine-alane. J Vac Sci Technol A 7:3117-3118
2. Danilatos GD (1988) Foundations of environmental scanning electron microscopy. Adv Electronics Electron Phys 71:109-250
3. Danilatos GD (1990) Theory of the gaseous detector device in the environmental scanning electron microscope. Adv Electronics Electron Phys 78:1-102
4. 2 in an environmental transmission electron microscope. J Appl Phys 77: 2846-2848
5. Sharma R, Weiss K, McKelvy M, Glaunsinger W (1994) Gas reaction chamber for gas solid intercalation studies by high resolution electronmicroscopy. Proc 52nd Annu Mtg Microsc Soc Am 494-495