Effect of amorphous Si on the epitaxial growth of CoSi2 by Co/Si/Ti/Si solid state epitaxy

International Conference on Solid-State and Integrated Circuit Technology Proceedings

Volumn , Issue , 1998, Pages 264-267

  Qu, Xin Ping ^a   Ru, Guo Ping ^a   Liu, Jian Hai ^a   Mo, Hong Xiang ^a   Liu, Jing ^a   Li, Bing Zong ^a   Chu, Paul K ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; COBALT COMPOUNDS; EPITAXIAL GROWTH; MULTILAYERS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SINGLE CRYSTALS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

SELF-ALIGNED SILICIDE;

SEMICONDUCTOR JUNCTIONS;

EID: 0032226782     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (6)