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Volumn , Issue , 1998, Pages 6-7
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Tunnel oxide and ETOX flash scaling limitation
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Author keywords
[No Author keywords available]
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Indexed keywords
DIELECTRIC MATERIALS;
ELECTRON TRANSPORT PROPERTIES;
ELECTRON TRAPS;
ELECTRON TUNNELING;
LEAKAGE CURRENTS;
NITRIDING;
OXIDES;
THICKNESS MEASUREMENT;
CHANNEL HOT ELECTRON PROGRAMMING;
FLASH SCALING LIMITATION;
MULTI LEVEL CELL STORAGE TECHNOLOGY;
TUNNEL OXIDE;
DYNAMIC RANDOM ACCESS STORAGE;
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EID: 0032226456
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (41)
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References (1)
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