Silicon-on-silicon rib waveguides with a high-confining ion-implanted lower cladding

IEEE Journal on Selected Topics in Quantum Electronics

Volumn 4, Issue 6, 1998, Pages 983-988

  Cocorullo, Giuseppe ^a,b,c,e,f   Della Corte, Francesco G ^{a,b,e,g,h,i,j}   Iodice, Mario ^a,b,d,e,k,l   Rendina, Ivo ^b   Sarro, Pasqualina M ^a,d  

^a IEEE   (Italy)

^b CNR   (Italy)

^c UNIVERSITY OF CALABRIA   (Italy)

^d DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^e UNIVERSITY OF NAPLES FEDERICO II   (Italy)

^f Microelectronic Department   (Italy)

^g Ist Ric Per l'E   (Italy)

^h DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

ⁱ OPTEL   (Italy)

^j IRECE CNR   (Italy)

^k Res Inst Electromagnetism E   (Italy)

^l Princeton University   (United States)

more..

Author keywords

Integrated optics; Microelectronic processes; Optical waveguides; Silicon optoelectronics

Indexed keywords

ATTENUATION; EPITAXIAL GROWTH; INTEGRATED OPTICS; ION IMPLANTATION; MICROELECTRONIC PROCESSING; NUMERICAL ANALYSIS; OPTICAL FIBER COUPLING; SEMICONDUCTOR DOPING; SEMICONDUCTOR GROWTH; SILICON WAFERS; THERMAL CONDUCTIVITY OF SOLIDS; VLSI CIRCUITS;

SILICON-ON-SILICON RIB WAVEGUIDES;

OPTICAL WAVEGUIDES;

EID: 0032208609     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/2944.736091     Document Type: Article

References (9)

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