Amorphous chromium silicide formation in hydrogenated amorphous silicon

Journal of Electronic Materials

Volumn 27, Issue 11, 1998, Pages 1268-1271

  Kovsarian, A ^a   Shannon, J M ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

Amorphous chromium suicide; Amorphous thin films; Hydrogenated amorphous silicon; Silicide growth

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS FILMS; AMORPHOUS SILICON; ANNEALING; CHROMIUM COMPOUNDS; CRYSTALLINE MATERIALS; SPUTTER DEPOSITION; THERMAL CONDUCTIVITY OF SOLIDS; THIN FILMS;

SILICIDE GROWTH;

SEMICONDUCTING FILMS;

EID: 0032207778     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-998-0081-8     Document Type: Article

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