Molecular dynamics simulation on elastic behavior of Ni/Ni3Al interface with graded structure

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Volumn 62, Issue 11, 1998, Pages 978-985

  Aihara Jr , Tomoyasu ^a   Sho, Tomoyoshi ^a,b,c   Kawazoe, Yoshiyuki ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c Komatsu Corp   (Japan)

Author keywords

Atomistic stress; Functionally graded materials; Molecular dynamics; Nickel; interface

Indexed keywords

COMPUTER SIMULATION; CRYSTAL ATOMIC STRUCTURE; CRYSTAL ORIENTATION; ELASTICITY; LATTICE CONSTANTS; MOLECULAR DYNAMICS; NICKEL; NICKEL ALLOYS; POTENTIAL ENERGY; STRAIN; STRESS ANALYSIS; STRESS CONCENTRATION;

FUNCTIONALLY GRADED MATERIALS; NICKEL ALUMINIDE;

INTERFACES (MATERIALS);

EID: 0032207021     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet1952.62.11_978     Document Type: Article

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