Moisture-resistant properties of SiNx films prepared by PECVD

Thin Solid Films

Volumn 333, Issue 1-2, 1998, Pages 71-76

  Lin, Hui ^a   Xu, Liqiang ^a   Chen, Xiang ^a   Wang, Xuhong ^a   Sheng, Mei ^a   Stubhan, Frank ^b   Merkel, Karl Heinz ^b   Wilde, Juergen ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b DAIMLER AG   (Germany)

Author keywords

Chemical vapor deposition; Coatings; Plasma processing and deposition; Silicon nitride

Indexed keywords

CERAMIC COATINGS; MECHANICAL PERMEABILITY; MOISTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; WATERPROOF COATINGS;

MOISTURE RESISTANCE;

THIN FILMS;

EID: 0032205532     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00812-8     Document Type: Article

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