SCOPUS 정보 검색 플랫폼

Surface Science

Volumn 417, Issue 2-3, 1998, Pages 268-280

An interpretation of the temperature-dependent growth mode of copper on the Cu(100)(2√2 × √2)R45°-O surface

(2) Nakamura, Keikichi a,b,c Yata, Masanori a

a NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Japan)

b JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

c ZHEJIANG UNIVERSITY (China)

Author keywords

Copper; Growth; Oxygen; Reflective high energy electron diffraction; Surface diffusion; Surface kinetics and thermodynamics; Surface reconstruction

Indexed keywords

COPPER; DIFFUSION; HIGH ENERGY ELECTRON DIFFRACTION; INTERFACIAL ENERGY; OXYGEN; REACTION KINETICS; SURFACE STRUCTURE; SURFACE TREATMENT; THERMAL EFFECTS; THERMODYNAMICS;

REFLECTIVE HIGH ENERGY ELECTRON DIFFRACTION; SURFACE DIFFUSION; SURFACE KINETICS; SURFACE RECONSTRUCTION;

EPITAXIAL GROWTH;

EID: 0032205242 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(98)00656-6 Document Type: Article

Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.