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Applied Physics A: Materials Science and Processing

Volumn 67, Issue 5, 1998, Pages 513-516

Modeling the preparation of pc-Si thin films with a Cu vapor laser

(5) Andra G a Falk, F a Muhlig C a Kalbac A b Cerny R b

a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY (Germany)

b CZECH TECHNICAL UNIVERSITY IN PRAGUE (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; COMPUTER SIMULATION; CRYSTALLIZATION; FILM GROWTH; LASER BEAMS; MATHEMATICAL MODELS; OPTICAL MICROSCOPY; PHASE TRANSITIONS; POLYCRYSTALLINE MATERIALS; PULSED LASER APPLICATIONS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

COPPER VAPOR LASER; POLYCRYSTALLINE SILICON;

FILM PREPARATION;

EID: 0032205091 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390050813 Document Type: Article

Times cited : (4)

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