Fabrication and characterization of Yb 3+ : Er 3+ phosphosilicate fibers for lasers

Journal of Lightwave Technology

Volumn 16, Issue 11, 1998, Pages 1990-2001

  Vienne, Guillaume G ^{a,b,d,e,f,g,h,i}   Caplen, Julie E ^a,c   Dong, Liang ^a,c,h,j,k   Minelly, John D ^a,c,l   Nilsson, Johan ^a,h,m,n,o,p   Payne, David N ^a,d,q  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

^b HOYA R and D Center   (Japan)

^c Corning Inc ^*  (United States)

^d Ecl Sup d'Ingenieur E ^*

^e Optoelectronics Research Centre   (France)

^f UNIVERSITY OF KARLSRUHE   (Germany)

^g UNIVERSITY OF ESSEX   (United Kingdom)

^h Optoelectronics Research Centre   (Japan)

ⁱ HOYA CORPORATION   (Japan)

^j HARBIN INSTITUTE OF TECHNOLOGY   (China)

^k Southampton University   (United Kingdom)

^l UNIVERSITY OF STRATHCLYDE   (United Kingdom)

^m CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

ⁿ ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^o Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^p SAMSUNG Electronics   (South Korea)

^q OPTICAL SOCIETY OF AMERICA   (United States)

more..

Author keywords

Fiber lasers; MCVD; Yb 3+ : Er 3+ codoped fibers

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ERBIUM; FABRICATION; IONS; OPTICAL GLASS; PHOSPHORUS COMPOUNDS; SEMICONDUCTOR DOPING; SEMICONDUCTOR LASERS; YTTERBIUM;

MODIFIED CHEMICAL VAPOR DEPOSITION; PHOSPHOSILICATE; SENSITIVE PRESINTERING PASS;

FIBER LASERS;

EID: 0032205082     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/50.730360     Document Type: Article

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