-
1
-
-
0025505721
-
A 50-ns 16-Mb DRAM with a 10-ns data rate and on-chip ECC
-
Oct.
-
H. L. Kalter, C. H. Stapper, J. E. Barth, Jr., J. Dilorenzo, C. E. Drake, J. A. Fifield, G. A. Kelley, Jr., S. C. Lewis, W. B. Van Der Hoeven, and J. A. Yankosky, "A 50-ns 16-Mb DRAM with a 10-ns data rate and on-chip ECC," IEEE J. Solid State Circuits, vol. 25, pp. 1118-1128, Oct. 1990.
-
(1990)
IEEE J. Solid State Circuits
, vol.25
, pp. 1118-1128
-
-
Kalter, H.L.1
Stapper, C.H.2
Barth Jr., J.E.3
Dilorenzo, J.4
Drake, C.E.5
Fifield, J.A.6
Kelley Jr., G.A.7
Lewis, S.C.8
Van Der Hoeven, W.B.9
Yankosky, J.A.10
-
2
-
-
0021476780
-
dd bit-line sensing scheme in CMOS DRAM'S
-
Aug.
-
dd bit-line sensing scheme in CMOS DRAM'S," IEEE J. Solid-State Circuits, vol. SC-19, pp. 451-454, Aug. 1984.
-
(1984)
IEEE J. Solid-State Circuits
, vol.SC-19
, pp. 451-454
-
-
Lu, N.1
Chao, H.H.2
-
3
-
-
0029252087
-
Circuit design techniques for low- Voltage operating and/or giga-scale DRAM'S
-
Feb.
-
T. Yamagata, S. Tomishima, M. Tsukude, Y. Hashizume, and K. Arimoto, "Circuit design techniques for low- voltage operating and/or giga-scale DRAM'S," in ISSCC Dig. Tech. Papers, Feb. 1995, pp. 48-249.
-
(1995)
ISSCC Dig. Tech. Papers
, pp. 48-249
-
-
Yamagata, T.1
Tomishima, S.2
Tsukude, M.3
Hashizume, Y.4
Arimoto, K.5
-
4
-
-
0029406986
-
Low voltage circuit design techniques for battery-operated and/or giga-scale DRAM's
-
Nov.
-
T. Yamagata, S. Tomishima, M. Tsukude, T. Tsuruda, Y. Hashizume, and K. Arimoto, "Low voltage circuit design techniques for battery-operated and/or giga-scale DRAM's," IEEE J. Solid-State Circuits, vol. 30, pp. 1183-1188, Nov. 1995.
-
(1995)
IEEE J. Solid-State Circuits
, vol.30
, pp. 1183-1188
-
-
Yamagata, T.1
Tomishima, S.2
Tsukude, M.3
Tsuruda, T.4
Hashizume, Y.5
Arimoto, K.6
-
5
-
-
0028538213
-
An experimental 256-Mb DRAM with boosted senseground scheme
-
Nov.
-
M. Asakura, T. Ooishi, M. Tsukude, S. Tomishima, T. Eimori, H. Hidaka, Y. Ohno, K. Arimoto, K. Fujishima, T. Nishimura, and t. Yoshihara, "An experimental 256-Mb DRAM with boosted senseground scheme," IEEE J. Solid-State Circuits, vol. 29, pp. 1303-1309, Nov. 1994.
-
(1994)
IEEE J. Solid-State Circuits
, vol.29
, pp. 1303-1309
-
-
Asakura, M.1
Ooishi, T.2
Tsukude, M.3
Tomishima, S.4
Eimori, T.5
Hidaka, H.6
Ohno, Y.7
Arimoto, K.8
Fujishima, K.9
Nishimura, T.10
Yoshihara, T.11
-
6
-
-
0031072202
-
A 256 Mb SDRAM using a register-controlled digital DLL
-
Feb.
-
A. Hatakeyama, H. Mochizuki, T. Aikawa, M. Takita, Y. Ishii, H. Tsuboi, S. Fujioka, S. Yamaguchi, M. Koga, Y. Serizawa, K. Nishimura, K. Kawabata, Y. Okajima, M. Kawano, H. Kojima, K. Mizutani, T. Anezaki, M. Hasegawa, and M. Taguchi, "A 256 Mb SDRAM using a register-controlled digital DLL," in ISSCC Dig. Tech. Papers, Feb. 1997, pp. 72-73.
-
(1997)
ISSCC Dig. Tech. Papers
, pp. 72-73
-
-
Hatakeyama, A.1
Mochizuki, H.2
Aikawa, T.3
Takita, M.4
Ishii, Y.5
Tsuboi, H.6
Fujioka, S.7
Yamaguchi, S.8
Koga, M.9
Serizawa, Y.10
Nishimura, K.11
Kawabata, K.12
Okajima, Y.13
Kawano, M.14
Kojima, H.15
Mizutani, K.16
Anezaki, T.17
Hasegawa, M.18
Taguchi, M.19
-
7
-
-
0031678266
-
A 256 Mb SDRAM with subthreshold leakage current suppression
-
Feb.
-
M. Hasegawa, M. Nakamura, S. Narui, S. Ohkuma, Y. Kawase, H. Endoh, S. Miyatake, T. Akiba, K. Kawakita, M. Yoshida, S. Yamada, T. Sekiguchi, and Asano, Y. Tadaki, R. Nagai, S. Miyaoka, K. Kajigaya, M. Horiguchi, and Y. Nakagome, "A 256 Mb SDRAM with subthreshold leakage current suppression," in ISSCC Dig. Tech. Papers, Feb. 1998, pp. 80-81.
-
(1998)
ISSCC Dig. Tech. Papers
, pp. 80-81
-
-
Hasegawa, M.1
Nakamura, M.2
Narui, S.3
Ohkuma, S.4
Kawase, Y.5
Endoh, H.6
Miyatake, S.7
Akiba, T.8
Kawakita, K.9
Yoshida, M.10
Yamada, S.11
Sekiguchi, T.12
Asano13
Tadaki, Y.14
Nagai, R.15
Miyaoka, S.16
Kajigaya, K.17
Horiguchi, M.18
Nakagome, Y.19
-
8
-
-
0030648915
-
Fully planarized stacked capacitor cell with deep and high aspect ratio contact hole for giga-bit DRAM
-
K. Itabashi, S. Tsuboi, H. Nakamura, K. Hashimoto, W. Futoh, K. Fukuda, I. Hanya, S. Asai, T. Chijimatsu, E. Kawamura, T. Yao, H. Takagi, Y. Ohta, T. Karasawa, H. Iio, M. Onoda, F. lnoue, H. Nomura, Y. Satoh, M. Hikashimoto, M. Matsumiya, T. Miyabo, T. Ikeda, T. Yamazaki, M. Miyajima, K. Watanabe, S. Watanabe, and M. Taguchi, "Fully planarized stacked capacitor cell with deep and high aspect ratio contact hole for giga-bit DRAM," in Symp. VLSI Technology Dig. Tech. Papers, 1997, pp. 21-22.
-
(1997)
Symp. VLSI Technology Dig. Tech. Papers
, pp. 21-22
-
-
Itabashi, K.1
Tsuboi, S.2
Nakamura, H.3
Hashimoto, K.4
Futoh, W.5
Fukuda, K.6
Hanya, I.7
Asai, S.8
Chijimatsu, T.9
Kawamura, E.10
Yao, T.11
Takagi, H.12
Ohta, Y.13
Karasawa, T.14
Iio, H.15
Onoda, M.16
Lnoue, F.17
Nomura, H.18
Satoh, Y.19
Hikashimoto, M.20
Matsumiya, M.21
Miyabo, T.22
Ikeda, T.23
Yamazaki, T.24
Miyajima, M.25
Watanabe, K.26
Watanabe, S.27
Taguchi, M.28
more..
|