Grazing incidence X-ray diffraction analysis of alkali fluoride thin films for optical devices

Thin Solid Films

Volumn 333, Issue 1-2, 1998, Pages 157-164

  Cremona, M ^a   Mauricio, M H P ^a   Fehlberg, L V ^a   Nunes, R A ^a   Scavarda Do Carmo, L C ^a   De Avillez, R R ^a   Caride, A O ^b  

^a PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO   (Brazil)

^b CENTRO BRASILEIRO DE PESQUISAS FÍSICAS   (Brazil)

Author keywords

Alkali halides; Optical device; Residual stress; X ray diffraction

Indexed keywords

ALKALI METAL COMPOUNDS; FLUORINE COMPOUNDS; MULTILAYERS; OPTOELECTRONIC DEVICES; POLYCRYSTALLINE MATERIALS; RESIDUAL STRESSES; X RAY DIFFRACTION ANALYSIS;

FLUORIDES; POLYCRYSTALLINE THIN FILMS;

THIN FILMS;

EID: 0032204263     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00849-9     Document Type: Article

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