Solid phase epitaxy of a ternary system

Surface Science

Volumn 418, Issue 1, 1998, Pages 314-319

  Schmidt, C M ^a   Schaller, D M ^a   Meisinger, F ^a   Burgler D E ^a   Guntherodt H J ^a  

^a UNIVERSITY OF BASEL   (Switzerland)

Author keywords

Alloys; Copper; Crystalline amorphous interfaces; Crystallization; Scanning tunnelling microscopy; Silicon; Solid phase epitaxy; Zirconium

Indexed keywords

ANNEALING; BINARY ALLOYS; CRYSTAL ORIENTATION; CRYSTALLIZATION; EPITAXIAL GROWTH; LOW ENERGY ELECTRON DIFFRACTION; MOLECULAR STRUCTURE; PHASE INTERFACES; PHASE TRANSITIONS; SCANNING TUNNELING MICROSCOPY; SILICON; ZIRCONIUM ALLOYS;

SOLID PHASE EPITAXY; X RAY PHOTOEMISSION SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 0032204099     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00729-8     Document Type: Article

References (23)

1. K. Maex, M. van Rossum (Eds.), Properties of Metal Silicides, emis datareview series no. 14, 1995.
2. H. von Känel, Mater. Sci. Rep. 8 (1992) 193.
3. R.T. Tung, J.M. Gibson, J.M. Poate, Phys. Rev. Lett. 50 (1983) 429.
4. U.K. Koehler, J.E. Demuth, R.J. Hamers, Phys. Rev. Lett. 60 (1988) 2499.
5. H. von Känel et al., Phys. Rev. B 45 (1992) 13807.
6. A.L. Vazquez de Parga, J. de la Figuera, C. Ocal, R. Miranda, Europhys. Lett. 18 (1992) 595.
7. R. Stalder, C. Schwarz, H. Sirringhaus, H. von Känel, Surf. Sci. 271 (1992) 355.
8. L. Casalis, C. Casati, R. Rosei, M. Kiskinova, Surf. Sci. 331-333 (1995) 381.
9. M. Setton, in: K. Maex, M. van Rossum (Eds.), Properties of Metal Silicides, emis datareview series no. 14, 1995, p. 129.
10. G. Tarrach et al., J. Vac. Sci. Technol. B 9 (1991) 677.
11. A. Regenbrecht, G. von Minnigerode, K. Samwer, Z. Phys. B 79 (1990) 25.
12. T.M. Schaub, D.E. Bürgler, H.-J. Güntherodt, Europhys. Lett. 36 (1996) 601.
13. T.M. Schaub, D.E. Bürgler, C.M. Schmidt, H.-J. Güntherodt, J. Non-Cryst. Solids 205-207 (1996) 748.
14. N.D. Lang, Phys. Rev. Lett. 56 (1986) 1164.
15. D.M. Eigler, P.S. Weiss, E.K. Schweizer, N.D. Lang, Phys. Rev. Lett. 66 (1991) 1189.
16. Z. Altounian, T. Guo-hua, J.O. Strom-Olsen, J. Appl. Phys. 53 (1982) 4755.
17. J.M. Slaughter, A. Sharpiro, P.A. Kearney, C.M. Falco, Phys. Rev. B 44 (1991) 3854.
18. H. Sprenger, J. Less-Common Met. 34 (1974) 39.
19. B. Reinker, M. Moske, K. Samwer, Phys. Rev. B 56 (1997) 9887.
20. D.E. Bürgler et al., to be published.
21. L. Stolt, F.M. d'Heurle, Thin Solid Films 189 (1990) 269.
22. J.Y. Cheng, L.J. Chen, J. Appl. Phys. 68 (1990) 4002.
23. M. Setton, J. van der Spiegel, J. Appl. Phys. 70 (1991) 193.