Micro-surface Roughening of Paper by Sputter Etching and its Optical Application Part 1. Effect of Sputtering Conditions on Fine Structure of Paper Surface

Kami Pa Gikyoshi/Japan Tappi Journal

Volumn 52, Issue 11, 1998, Pages 1616-1622

  Yamauchi, Tatsuo ^a   Fukui, Satoshi ^a  

^a NONE

Author keywords

Etching; Glossiness; Microstructure; Sputtering; Surface treatment

Indexed keywords

ETCHING; GLOSS MEASUREMENT; MICROSTRUCTURE; OPTICAL PROPERTIES; PRESSURE EFFECTS; SPUTTERING; SURFACE PROPERTIES; SURFACE ROUGHNESS; SURFACE TREATMENT;

SPUTTER ETCHING;

PAPER;

EID: 0032203657     PISSN: 0022815X     EISSN: None     Source Type: Journal    
DOI: 10.2524/jtappij.52.1616     Document Type: Article

References (10)

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2. Chapman, B. N. : Glow discharge processes : sputtering and plasma etching New York Wiley 1980
3. Tagavva, T., and J. Mori : J. : Electron Microsc., 27 (4), 267 (1978)
4. Ryu, J., J. Dai, K. Koo and T. Wakida : JSDC 108, 278 (1992)
5. Mcknight, T. S., R. H. Marchessault, and S. G. Mason : Pulp Paper Mag. Canada 59, 81 (1958)
6. Seth, R., H. Jang, B. Chan and C. Wu : The Fundamentals of Papermaking Materials ed. by C. F. Baker Leatherhead U. K. Pira International ; p. 473 (1997)