Modeling and simulation of grain growth in Si3N4-II. The α-β transformation

Acta Materialia

Volumn 46, Issue 18, 1998, Pages 6551-6557

  Kitayama, M ^a   Hirao, K ^b   Toriyama, M ^b   Kanzaki, S ^b  

^a Fine Ceramics Research Association   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ASPECT RATIO; COMPUTER SIMULATION; GRAIN GROWTH; INTERFACES (MATERIALS); MATHEMATICAL MODELS; PHASE TRANSITIONS; RATE CONSTANTS;

ALPHA-BETA TRANSFORMATION; ANISOTROPIC OSTWALD RIPENING MODEL;

SILICON NITRIDE;

EID: 0032203204     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(98)00291-2     Document Type: Article

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