Preparation and characterization of freestanding porous silicon films with high porosities

Electrochemical and Solid-State Letters

Volumn 1, Issue 5, 1998, Pages 227-229

  Xu, Dongsheng ^a   Guo, Guolin ^a   Gui, Linlin ^a   Tang, Youqi ^a   Zhang, Bairei ^b   Qin, Guoguang ^b  

^a Peking University   (China)

^b PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; DRYING; ETCHING; FILM PREPARATION; LIGHT ABSORPTION; LIGHT TRANSMISSION; PHOTOLUMINESCENCE; POROSITY; POROUS SILICON; RAMAN SCATTERING;

NONCOLLAPSED FREESTANDING POROUS SILICON FILMS;

DIELECTRIC FILMS;

EID: 0032203029     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390694     Document Type: Article

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