Micro free-form fabrication of aluminum nitride and zinc oxide

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 11, 1998, Pages 6128-6134

  Otake, Naoto ^a   Liu, Lisheng ^a   Yasuhara, Toshiyuki ^a   Kato, Kazunori ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Aluminum nitride; Ar ion laser; Ceramic thin films; Free form fabrication; Micro structure; Reactive vapor deposition; Selective growth; Zinc oxide

Indexed keywords

ALUMINUM COMPOUNDS; AMMONIA; CERAMIC MATERIALS; ELECTRON GUNS; FILM GROWTH; GAS LASERS; OXYGEN; PIEZOELECTRIC MATERIALS; SILICON WAFERS; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

ALUMINUM NITRIDE; MICRO FREE FORM FABRICATION; REACTIVE VAPOR DEPOSITION;

DIELECTRIC FILMS;

EID: 0032202728     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6128     Document Type: Article

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