Etch-induced stress failures of SiO2 cantilever beams

Sensors and Actuators, A: Physical

Volumn 70, Issue 3, 1998, Pages 283-290

  Shafai, C ^a   Brett, M J ^a   Hrudey, T M ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

Author keywords

Cantilever beams; Etch induced stress; SiO2

Indexed keywords

ANISOTROPY; ETCHING; FINITE ELEMENT METHOD; SILICA; STRESS ANALYSIS; STRESS CONCENTRATION;

ANISOTROPIC ETCHING;

SILICON SENSORS;

EID: 0032187588     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00137-X     Document Type: Article

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