Sputtering - Atomizing and optogalvanic properties of an Ar-Mg Hollow cathode discharge

Vacuum

Volumn 51, Issue 2, 1998, Pages 85-88

  Zhechev, D ^a   Atanassova, S ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIZATION; ATOMS; CATHODES; DENSITY (SPECIFIC GRAVITY); ELECTRIC CURRENTS; ELECTRIC DISCHARGES; IONS; MAGNESIUM; SPUTTERING;

HOLLOW CATHODE DISCHARGE (HCD); OPTOGALVANIC PROPERTIES; SPUTTERING COEFFICIENT;

PLASMAS;

EID: 0032184347     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(98)00138-9     Document Type: Article

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