Double unbalanced magnetron sputtering system used for ion-assisted thin film deposition

Vacuum

Volumn 51, Issue 2, 1998, Pages 119-126

  Groudeva Zotova, S ^a  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; IONS; METALLIC FILMS; PRESSURE EFFECTS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS;

DOUBLE MAGNETRON SPUTTERING SYSTEMS; ION-ASSISTED DEPOSITION;

MAGNETRON SPUTTERING;

EID: 0032183333     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00144-4     Document Type: Article

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