Post-CMP cleaning using acoustic streaming

Journal of Electronic Materials

Volumn 27, Issue 10, 1998, Pages 1095-1098

  Busnaina, Ahmed A ^a   Elsawy, T M ^a  

^a CLARKSON UNIVERSITY   (United States)

Author keywords

Acoustic streaming; Megasonic cleaning; Particle removal; Post chemical mechanical polishing; Silica slurry; Surface cleaning

Indexed keywords

ACOUSTIC STREAMING; AMMONIA; CONTAMINATION; SILICA; SILICON WAFERS; SLURRIES;

BRUSH CLEANING; MEGASONIC CLEANING; NONCONTACT SURFACE CLEANING; PARTICLE REMOVAL; POST CHEMICAL MECHANICAL POLISHING CLEANING;

CLEANING;

EID: 0032183295     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-998-0143-y     Document Type: Article

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