Laser pulse induced change of CoSi2-SiO2-Si structure

Vacuum

Volumn 51, Issue 2, 1998, Pages 251-254

  Knite, M ^a   Medvid', A ^a   Grigonis, A ^b  

^a RIGA TECHNICAL UNIVERSITY   (Latvia)

^b KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE LASERS; CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY OF SOLIDS; LASER BEAM EFFECTS; MULTILAYERS; NEODYMIUM LASERS; OPTICAL CORRELATION; Q SWITCHED LASERS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CRYSTALLINE FILMS; LASER INITIATED FORMATION;

METALLIC FILMS;

EID: 0032182633     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(98)00169-9     Document Type: Article

References (6)

1. Murarka, S. P., Suicides for VLSI Application, Academic Press, New York, 1983, p. 176.
2. Gavars, P., Medvid, A., Puritis, T., Arman, M. and Balodis, A., Laser Radiation Influence on Silicide Cobalt Structure, Latv. J. Phys. Techn. Sci., 1989, N6, 75-79.
3. Dolle, M., Mantl, S. and Bay, H. L., A new method for silicide patterning based on local oxidation, Proc. of ESSDERC'95, Hague, Netherlands, Sept. 25-27, 1995, p. 663-670.
4. 2-Si multilayer structure, Appl. Surf. Sci., 1997, 115, 393-398.
5. Tung, R. T., Gibson, J. M., Jacobson, D. C. and Poate, J. M., Liquid phase growth of epitaxial Ni and Co silicides, Appl. Phys. Lett., 1983, 43, 476-478.
6. Baeri, P., Pulsed laser induced modifications of metal silicide layers, Thin Solid Films, 1994, 241, 142-150.