Influence of electrostatic forces on the imaging process in scanning tunneling microscopy

Thin Solid Films

Volumn 331, Issue 1-2, 1998, Pages 203-209

  Schlaf, R ^a   Schroeder, P G ^a   Nelson, M W ^a   Stubner R ^b   Tiefenbacher, S ^b   Jungblut, H ^b   Parkinson, B A ^a  

^a Department of Environmental and Radiological Health Sciences   (United States)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURRENT DENSITY; ELECTROSTATICS; MOLYBDENUM COMPOUNDS; MORPHOLOGY; SCANNING TUNNELING MICROSCOPY; SUBSTRATES; ULTRATHIN FILMS; X RAY DIFFRACTION ANALYSIS;

BIAS APPLIED ATOMIC FORCE MICROSCOPY (BAAFM); MOLYBDENUM TELLURIDE;

SEMICONDUCTOR MATERIALS;

EID: 0032181727     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00920-1     Document Type: Article

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