Aggregation mechanism in fullerene thin films on several substrates

Thin Solid Films

Volumn 331, Issue 1-2, 1998, Pages 131-140

  Yase, Kiyoshi ^a   Ara Kato, Norihiko ^b   Hanada, Takeshi ^a   Takiguchi, Hiroshi ^a,c   Yoshida, Yuji ^a   Back, Gernho ^a,d   Abe, Koji ^a   Tanigaki, Nobutaka ^a  

^a NATL INST OF MAT AND CHEM RES   (Japan)

^b RIKEN   (Japan)

^c HIROSHIMA UNIVERSITY   (Japan)

^d Changwon National University   (South Korea)

Author keywords

Epitaxial growth; Fullerene; Growth mechanism; Organic molecular beam deposition; Thin Film

Indexed keywords

ACTIVATION ENERGY; AGGLOMERATION; ATOMIC FORCE MICROSCOPY; CRYSTAL GROWTH; DIFFUSION IN SOLIDS; EPITAXIAL GROWTH; FILM GROWTH; NUCLEATION; SURFACE CHEMISTRY; THERMAL EFFECTS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ORGANIC MOLECULAR BEAM DEPOSITION (OMBD);

FULLERENES;

EID: 0032179731     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00909-2     Document Type: Article

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