Tensile properties of a series of V-4Ti-4Cr alloys containing small amounts of Si, Al and Y, and the influence of helium implantation

Journal of Nuclear Materials

Volumn 258-263, Issue PART 2 B, 1998, Pages 1497-1501

  Matsushima, Tetsuya ^a   Satou, Manabu ^a   Hasegawa, Akira ^a   Abe, Katsunori ^a   Kayano, Hideo ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HELIUM; ION IMPLANTATION; OXIDATION; TENSILE PROPERTIES; TENSILE TESTING;

HELIUM IMPLANTATION; PROOF-OXIDATION PROPERTIES;

VANADIUM ALLOYS;

EID: 0032179573     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(98)00212-8     Document Type: Article

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