Conversion of chemically deposited CuS thin films to Cu1.8S and Cu1.96S by annealing

Semiconductor Science and Technology

Volumn 13, Issue 10, 1998, Pages 1164-1169

  Nair, M T S ^a   Guerrero, Laura ^a   Nair, P K ^a  

^a INSTITUTO DE ENERGÍAS RENOVABLES   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BAND STRUCTURE; COPPER COMPOUNDS; THIN FILMS; X RAY DIFFRACTION;

SHEET RESISTANCE;

DEPOSITION;

EID: 0032179296     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/13/10/019     Document Type: Article

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