Ethanol-addition-enhanced, chemical vapor deposited tantalum oxide films from Ta(OC2H5)5 and oxygen precursors

Journal of the Electrochemical Society

Volumn 145, Issue 9, 1998, Pages 3247-3252

  Shinriki, Hiroshi ^a   Sugiura, Masahito ^a   Liu, Yijun ^a   Shimomura, Kouji ^a   Nakajima, Tsuyoshi ^a  

^a TOKYO ELECTRON LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ALDEHYDES; ANNEALING; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; DEHYDROGENATION; ETHANOL; HYDROLYSIS; OXYGEN; PLASMA APPLICATIONS; TANTALUM COMPOUNDS;

ETHOXIDE; TANTALUM OXIDE; TEMPERATURE PROGRAMMED DECOMPOSITION;

DIELECTRIC FILMS;

EID: 0032166995     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838793     Document Type: Article

References (9)