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Volumn 145, Issue 9, 1998, Pages 3150-3156
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Hydrogen evolution on thin-film deposited electrodes prepared by a plasma-based technique
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ARGON;
CATALYSTS;
ELECTRIC IMPEDANCE;
ELECTROPLATING;
GLOW DISCHARGES;
HYDROGEN;
ION BOMBARDMENT;
MORPHOLOGY;
NICKEL;
PALLADIUM;
PLASMA APPLICATIONS;
POLARIZATION;
VOLMER-HEYROVSKY REACTION;
ELECTROCHEMICAL ELECTRODES;
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EID: 0032166868
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1838778 Document Type: Article |
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Times cited : (6)
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References (23)
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