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Volumn 8, Issue 3, 1998, Pages 182-187

A method using V-grooves to monitor the thickness of silicon membrane with μm resolution

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; MEMBRANES; MONITORING; OPTICAL RESOLVING POWER; SILICON SENSORS; THICKNESS MEASUREMENT;

EID: 0032166241     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/8/3/002     Document Type: Article
Times cited : (20)

References (7)
  • 2
    • 0025698115 scopus 로고
    • New pressure sensor with inner-compensation for non-linearity and protection to over-pressure
    • Wu X P 1990 New pressure sensor with inner-compensation for non-linearity and protection to over-pressure Sensors Actuators A 21-23 65-9
    • (1990) Sensors Actuators A , vol.21-23 , pp. 65-69
    • Wu, X.P.1
  • 3
    • 0002345301 scopus 로고
    • Electrochemical p-n junction etch-stop for the formation of silicon micro-structures
    • Jackson T N, Tischler M A and Wise K D 1981 Electrochemical p-n junction etch-stop for the formation of silicon micro-structures IEEE Electron Device Lett. EDL-2 44-5
    • (1981) IEEE Electron Device Lett. , vol.EDL-2 , pp. 44-45
    • Jackson, T.N.1    Tischler, M.A.2    Wise, K.D.3
  • 4
    • 84963736461 scopus 로고
    • Ethylene diamine pyrocatechol water mixture shows etching anomaly in boron-doped silicon
    • Bohg A 1971 Ethylene diamine pyrocatechol water mixture shows etching anomaly in boron-doped silicon J. Electrochem. Soc. 118 401-2
    • (1971) J. Electrochem. Soc. , vol.118 , pp. 401-402
    • Bohg, A.1
  • 5
    • 0025414502 scopus 로고
    • Residual stress and mechanical properties of boron-doped p+-silicon films
    • Ding X, Ko W H and Mansour JM 1990 Residual stress and mechanical properties of boron-doped p+-silicon films Sensors Actuators A 21-23 866-71
    • (1990) Sensors Actuators A , vol.21-23 , pp. 866-871
    • Ding, X.1    Ko, W.H.2    Mansour, J.M.3
  • 6
    • 0028053386 scopus 로고
    • Optical in-situ monitoring of silicon diaphragm thickness during wet etching
    • Minami K, Tosaka H and Esashi M 1994 Optical in-situ monitoring of silicon diaphragm thickness during wet etching IEEE Proc. MEMS '94 pp 217-22
    • (1994) IEEE Proc. MEMS '94 , pp. 217-222
    • Minami, K.1    Tosaka, H.2    Esashi, M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.