Optical lithography: 100 nm and beyond

Semiconductor International

Volumn 21, Issue 10, 1998, Pages 78-84

  DeJule, Ruth ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSIONS (CD); OPTICAL PROXIMITY CORRECTION (OPC); PHASE SHIFT MASKS (PSM);

PHOTOLITHOGRAPHY;

EID: 0032165811     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

1. R. Kunz, et. al., Proc. SPIE, Vol. 2724, 1996, p. 365.
2. T. Wallow, et. al., Proc. SPIE, Vol. 3333, 1998, p. 92.
3. J. Opitz, et. al., SPIE PhotoMask, to be published, Kawasaki, Japan, 1998.
4. J.S. Petersen, et. al., SPIE PhotoMask, to be published, Kawasaki, Japan, 1998.
5. B.W. Smith, SPIE, Vol. 3334, 1998, p. 142.
6. A.K. Wong, et. al., SPIE, Vol. 3334, 1998, p. 106.
7. H. Iwasaki, et. al., SPIE PhotoMask, to be published, Kawasaki, Japan, 1998.