Limitation of HF-based chemistry for deep-submicron contact hole cleaning on silicides

Journal of the Electrochemical Society

Volumn 145, Issue 9, 1998, Pages 3240-3246

  Baklanov, M R ^a   Kondoh, E ^a   Donaton, R A ^a   Vanhaelemeersch, S ^a   Maex, K ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; DRY ETCHING; FLUORINE CONTAINING POLYMERS; HYDROFLUORIC ACID; POROUS MATERIALS; SILICA; SURFACE CLEANING; TITANIUM COMPOUNDS;

TITANIUM FLUORIDE; TITANIUM SILICIDE;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0032165762     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838792     Document Type: Article

References (15)