메뉴 건너뛰기




Volumn 19, Issue 9, 1998, Pages 317-319

A new metal-to-metal antifuse with amorphous carbon

Author keywords

Amorphous carbon; Antifuse; FPGA

Indexed keywords

AMORPHOUS MATERIALS; ELECTRIC BREAKDOWN OF SOLIDS; ELECTRIC RESISTANCE; FIELD PROGRAMMABLE GATE ARRAYS; PERMITTIVITY;

EID: 0032165285     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.709626     Document Type: Article
Times cited : (14)

References (22)
  • 4
    • 0026912595 scopus 로고
    • A novel double-metal structure for voltage-programmable links
    • Sept.
    • S. Cohen, J. Raffel, and P. Wyatt, "A novel double-metal structure for voltage-programmable links," IEEE Electron Device Lett., vol. 13, pp. 488-491, Sept. 1992.
    • (1992) IEEE Electron Device Lett. , vol.13 , pp. 488-491
    • Cohen, S.1    Raffel, J.2    Wyatt, P.3
  • 5
    • 85067057482 scopus 로고
    • Interconnect devices for field programmable gate array
    • C. Hu, "Interconnect devices for field programmable gate array," in IEDM Tech. Dig., 1992, pp. 591-594.
    • (1992) IEDM Tech. Dig. , pp. 591-594
    • Hu, C.1
  • 6
    • 0027880063 scopus 로고
    • Conductive filament of the programmed metal electrode amorphous silicon antifuse
    • K. Gordon and R. Wong, "Conductive filament of the programmed metal electrode amorphous silicon antifuse," in IEDM Tech. Dig., 1993, pp. 27-30.
    • (1993) IEDM Tech. Dig. , pp. 27-30
    • Gordon, K.1    Wong, R.2
  • 7
    • 0027867594 scopus 로고
    • A highly reliable metal-to-metal antifuse for high-speed field programmable gate arrays
    • M. Takagi, I. Yoshii, N. Ikeda, H. Yasuda, and H. Hama, "A highly reliable metal-to-metal antifuse for high-speed field programmable gate arrays," in IEDM Tech. Dig., 1993, pp. 31-34.
    • (1993) IEDM Tech. Dig. , pp. 31-34
    • Takagi, M.1    Yoshii, I.2    Ikeda, N.3    Yasuda, H.4    Hama, H.5
  • 11
    • 0028423603 scopus 로고
    • Characteristic voltage of programmed metal-to-metal antifuses
    • G. Zhang, C. Hu, P. Yu, S. Chiang, and E. Hamdy, "Characteristic voltage of programmed metal-to-metal antifuses," IEEE Electron Device Lett., vol. 15, pp. 166-168, 1994.
    • (1994) IEEE Electron Device Lett. , vol.15 , pp. 166-168
    • Zhang, G.1    Hu, C.2    Yu, P.3    Chiang, S.4    Hamdy, E.5
  • 12
    • 51249166913 scopus 로고
    • Effects of nitrogen trifluoride on the growth and properties of plasma-enhanced chemical-vapor-deposited diamond-like carbon films
    • S. S. Ang, G. Sreenivas, W. D. Brown, H. A. Naseem, and R. K. Ulrich, "Effects of nitrogen trifluoride on the growth and properties of plasma-enhanced chemical-vapor-deposited diamond-like carbon films," J. Electron. Mater., vol. 22, p. 347, 1993.
    • (1993) J. Electron. Mater. , vol.22 , pp. 347
    • Ang, S.S.1    Sreenivas, G.2    Brown, W.D.3    Naseem, H.A.4    Ulrich, R.K.5
  • 13
    • 11644311071 scopus 로고
    • Cambridge, U.K.: Cambridge Univ. Press
    • R. A. Street, Hydrogenated Aamorphous Silicon. Cambridge, U.K.: Cambridge Univ. Press, 1991, pp. 382-383.
    • (1991) Hydrogenated Aamorphous Silicon , pp. 382-383
    • Street, R.A.1
  • 15
    • 0346974565 scopus 로고
    • Hard amorphous (diamond-like) carbon
    • J. Robertson, "Hard amorphous (diamond-like) carbon," Progr. Solid State Chem., vol. 21, p. 199, 1991.
    • (1991) Progr. Solid State Chem. , vol.21 , pp. 199
    • Robertson, J.1
  • 16
    • 0020208072 scopus 로고
    • Properties of hydrogenated amorphous carbon films and the effects of doping
    • D. I. Jones and A. D. Stewart, "Properties of hydrogenated amorphous carbon films and the effects of doping," Philos. Mag., vol. B46, 1982, p. 423.
    • (1982) Philos. Mag. , vol.B46 , pp. 423
    • Jones, D.I.1    Stewart, A.D.2
  • 17
    • 0020829528 scopus 로고
    • Bonding in hydrogenated hard carbon studied by optical spectroscopy
    • B. Dischler, A. Bubenzer, and P. Koidl, "Bonding in hydrogenated hard carbon studied by optical spectroscopy," Solid State Commun., vol. 48, p. 105, 1983.
    • (1983) Solid State Commun. , vol.48 , pp. 105
    • Dischler, B.1    Bubenzer, A.2    Koidl, P.3
  • 18
    • 33645143382 scopus 로고
    • Use of Raman scattering to investigate disorder and crystalline formation in as-deposited and annealed carbon films
    • R. O. Dillon, John A. Woollum, and V. Katkanant, "Use of Raman scattering to investigate disorder and crystalline formation in as-deposited and annealed carbon films," Phys. Rev. B, vol. 29, p. 3482, 1984.
    • (1984) Phys. Rev. B , vol.29 , pp. 3482
    • Dillon, R.O.1    Woollum, J.A.2    Katkanant, V.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.