Using Scanning Force Microscopy (SFM) to investigate various cleaning procedures of different transparent conducting oxide substrates

Applied Surface Science

Volumn 134, Issue 1-4, 1998, Pages 22-30

  Nel, J M ^a   Demanet, C M ^b   Hillie, K T ^b   Auret, F D ^c   Gaigher, H L ^c  

^a VISTA UNIVERSITY   (South Africa)

^b University of Trunskei   (South Africa)

^c UNIVERSITY OF PRETORIA   (South Africa)

Author keywords

Atomic force microscopy (AFM); Cleaning; Substrate preparation

Indexed keywords

ADSORPTION; CRYSTAL IMPURITIES; MORPHOLOGY; OXIDES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING CADMIUM COMPOUNDS; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR DOPING; SURFACE CLEANING; SURFACE ROUGHNESS; TEXTURES; TRANSPARENCY;

CADMIUM SULFIDE; INDIUM TIN OXIDE; LATERAL FORCE MICROSCOPY (LFM); SCANNING FORCE MICROSCOPY (SFM);

SEMICONDUCTING FILMS;

EID: 0032163872     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00242-6     Document Type: Article

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