Internal stress control of boron thin film

Fusion Engineering and Design

Volumn 39-40, Issue , 1998, Pages 493-497

  Satomi, N ^a   Kitamura, M ^a   Sasaki, T ^a   Nishikawa, M ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; COMPRESSIVE STRESS; DEPOSITION; EVAPORATION; HYDROGEN; ION BOMBARDMENT; PROTECTIVE COATINGS; RADIATION EFFECTS; RESIDUAL STRESSES; STRESS ANALYSIS; STRESS RELIEF; TENSILE STRESS;

ION PEENING EFFECT;

TOKAMAK DEVICES;

EID: 0032156087     PISSN: 09203796     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0920-3796(98)00251-8     Document Type: Article

References (12)

1. J. Winter, H.G. Esser, L. Könen, et al., Boronization in TEXTOR, J. Nucl. Mater 162-164 (1989) 713.
2. U. Schneider, W. Poschenrieder, M. Bessenredt-Weberpals, et al., Boronization of ASDEX, J. Nucl. Mater. 176/177 (1990) 350.
3. H.F. Dylla, M.G. Bell, R.J. Hawryluk, et al., Effects of boronization of the first wall in TFTR, J. Nucl. Mater. 176/177 (1990) 337.
4. G.L. Jackson, J. Winter, K.H. Burrell, et al., Boronization in DIII-D, J. Nucl. Mater. 196-198 (1992) 236.
5. M. Saidoh, N. Ogiwara, M. Shimada, et al., Initial boronization of JT-60U tokamak using decaborane, Jpn. J. Appl. Phys. 32 (1993) 3276.
6. N. Satomi, S. Sato, K. Tanaka, M. Saidoh, M. Nishikawa, Mechanical properties of boron coatings, J. Nucl. Mater. 220-222 (1995) 752.
7. H.C. Liu, S.P. Murarka, Elastic and viscoelastic analysis of stress in thin films, J. Appl. Phys. 72 (1992) 3458.
8. F.M. D'Heurle, J.M.E. Harper, Note on the origin of intrinsic stress in films deposited via evaporation and sputtering, Thin Solid Films 171 (1989) 81.
9. K.H. Müller, Dependence of thin-film microstructure on deposition rate by means of a computer simulation, J. Appl. Phys. 58 (1985) 2573.
10. K.H. Müller, Stress and micro structure of sputter-deposited thin films: molecular dynamics investigations, J. Appl. Phys. 62 (1987) 1796.
11. H. Windischmann, An intrinsic stress scaling law for polycrystalline thin films prepared by ion beam sputtering, J. Appl. Phys. 62 (1987) 1800.
12. N. Matsunami, Y. Yamamura, Y. Itikawa et al., Energy dependence of the yields of ion-induced sputtering of monatomic solids, IPPJ-AM-32, 1983.