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Volumn 37, Issue 9 A, 1998, Pages 4904-4909
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Effects of nitrogen addition to fluorinated silicon dioxide films
a a a a a |
Author keywords
Addition of nitrogen; Charge transfer; Dielectric properties; Fluorinated silicon dioxide; Vibrational absorption; Water absorption
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Indexed keywords
CHARGE TRANSFER;
CHEMICAL BONDS;
COMPOSITION EFFECTS;
FLUORINE;
LIGHT ABSORPTION;
NITROGEN;
OPTICAL VARIABLES MEASUREMENT;
PERMITTIVITY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
TEMPERATURE;
WATER ABSORPTION;
AMMONIA FLOW RATE;
BONDING PROPERTIES;
FLUORINATED SILICON DIOXIDE FILMS;
VIBRATION ABSORPTION;
SILICA;
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EID: 0032156057
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.37.4904 Document Type: Article |
Times cited : (10)
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References (16)
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