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Volumn 37, Issue 9 A, 1998, Pages 4904-4909

Effects of nitrogen addition to fluorinated silicon dioxide films

Author keywords

Addition of nitrogen; Charge transfer; Dielectric properties; Fluorinated silicon dioxide; Vibrational absorption; Water absorption

Indexed keywords

CHARGE TRANSFER; CHEMICAL BONDS; COMPOSITION EFFECTS; FLUORINE; LIGHT ABSORPTION; NITROGEN; OPTICAL VARIABLES MEASUREMENT; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TEMPERATURE; WATER ABSORPTION;

EID: 0032156057     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.4904     Document Type: Article
Times cited : (10)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.