Potential of high-purity polycrystalline silicon carbide for thermistor applications

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 9 A, 1998, Pages 5078-5079

  De Vasconcelos, Elder Alpes ^a   Zhang, Wen Yi ^a   Uchida, Hidekazu ^a   Katsube, Teruaki ^a  

^a SAITAMA UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Polycrystalline semiconductors; Silicon carbide; Temperature sensors; Thermal properties; Thermistors

Indexed keywords

CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; TEMPERATURE MEASUREMENT; THERMISTORS; THERMODYNAMIC STABILITY;

CHEMICALLY STABLE; TEMPERATURE SENSOR;

SILICON CARBIDE;

EID: 0032155720     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.5078     Document Type: Article

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