Structural and electrical properties of cathodic sputtered thin chromium films

Surface and Coatings Technology

Volumn 107, Issue 2-3, 1998, Pages 197-199

  Butilenko, A K ^a   Vovk, A Ya ^a   Khan, H R ^b  

^a INSTITUTE OF MAGNETISM   (Ukraine)

^b Depart of Electrochemistry Research Institute for Precious Metals and Metal Chemistry Fem   (Germany)

Author keywords

Cathodic sputtering; Chromium films

Indexed keywords

CHROMIUM; COMPOSITION; ELECTRIC CONDUCTIVITY MEASUREMENT; ELECTRIC PROPERTIES; SPUTTER DEPOSITION; STRUCTURE (COMPOSITION); TEMPERATURE; THICKNESS MEASUREMENT; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CATHODIC SPUTTERING; CHROMIUM OXIDES; REACTIVE DEPOSITION; TEMPERATURE COEFFICIENT OF RESISTIVITY;

CHROMIUM PLATING;

EID: 0032155458     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00583-0     Document Type: Article

References (4)

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3. Abeles B., Sheng P., Coutts M.D., Arie Y. Adv. Phys. 24(3):1975;407.
4. McLachlan D.S., Blaszkiewicz M., Newnham R.E. J. Am. Ceram. Soc. 73(8):1990;2187.