A consideration of electrode polishing prior to application of pulsed amperometric detection

Talanta

Volumn 46, Issue 6, 1998, Pages 1507-1514

  Inoue, Ayano ^a   Earley, Rosa L ^a   Lehmann, Mark W ^a   Welch, Lawrence E ^a  

^a KNOX COLLEGE   (United States)

Author keywords

Electrode polishing; Electrode response; PAD

Indexed keywords

EID: 0032145107     PISSN: 00399140     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-9140(98)00018-6     Document Type: Article

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