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Volumn 54, Issue 1-4, 1998, Pages 363-368

Assessment of diffusion processes in thin films

Author keywords

Diffusion processes; Thin films

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DIFFUSION IN SOLIDS; GRAIN BOUNDARIES; HIGH TEMPERATURE EFFECTS; LIGHT ABSORPTION; LIGHT EMISSION; MATHEMATICAL MODELS; SOLAR ABSORBERS; SPUTTERING; SUBSTRATES; THIN FILMS; VACUUM;

EID: 0032140905     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(98)00087-7     Document Type: Article
Times cited : (1)

References (4)
  • 3
    • 85081191816 scopus 로고    scopus 로고
    • Diploma thesis, Fraunhofer Institute for Solar Energy Systems, Freiburg
    • T. Kaltenbach, Diploma thesis, Fraunhofer Institute for Solar Energy Systems, Freiburg, 1996.
    • (1996)
    • Kaltenbach, T.1
  • 4
    • 85081190939 scopus 로고
    • Dissertation thesis, Korngrenzen und Volumendiffusion in polykristallinen, dünnen Kupfer/ Nickel-Mehrschichtsystemen, Uni Regensburg
    • R. Venos, Dissertation thesis, Korngrenzen und Volumendiffusion in polykristallinen, dünnen Kupfer/ Nickel-Mehrschichtsystemen, Uni Regensburg, 1989.
    • (1989)
    • Venos, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.