XPS and x-ray diffraction characterization of thin Co-Al-N alloy films prepared by reactive sputtering deposition

Surface and Interface Analysis

Volumn 26, Issue 9, 1998, Pages 659-666

  Asami, K ^a   Ohnuma, S ^b   Masumoto, T ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b Research Institute of Electric and Magnetic Alloys Sendai   (Japan)

Author keywords

Co Al N; Magnetic materials; Nano composite; Nanogranular materials; Thin film; X ray diffraction; XPS

Indexed keywords

COPPER ALLOYS; FILM PREPARATION; GRANULAR MATERIALS; MATHEMATICAL MODELS; METALLIC FILMS; NANOSTRUCTURED MATERIALS; PARTICLES (PARTICULATE MATTER); PHASE COMPOSITION; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

FACE-CENTERED CUBIC (FCC) STRUCTURE;

MAGNETIC THIN FILMS;

EID: 0032140395     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199808)26:9<659::AID-SIA412>3.0.CO;2-Z     Document Type: Article

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