High temperature phase and morphological changes of CVD-SiC films studied using in situ X-ray diffractometry

Materials Letters

Volumn 36, Issue 5-6, 1998, Pages 284-289

  Kingetsu, Toshiki ^a,b   Ito, Kenjiro ^a,c   Takehara, Masaharu ^a,d  

^a Japan Ultra high Temp Mat Res I   (Japan)

^b X ray Research Laboratory   (Japan)

^c Stl and Technol Devmt Labs   (Japan)

^d NIPPON STEEL CORPORATION   (Japan)

Author keywords

CVD SiC films; High temperature phase; Morphology; X ray diffractometry

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; GRAPHITE; HIGH TEMPERATURE EFFECTS; MORPHOLOGY; PHASE TRANSITIONS; POLYCRYSTALLINE MATERIALS; SILICON CARBIDE; SUBLIMATION; SURFACE STRUCTURE; THERMAL GRADIENTS; X RAY CRYSTALLOGRAPHY;

DENDRITES;

CERAMIC COATINGS;

EID: 0032140065     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(98)00046-9     Document Type: Article

References (9)

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