-
2
-
-
0000465888
-
-
Oh, Y. T.; Byun, S. C.; Lee, B. R.; Kang, T. W.; Hong, C. Y.; Park, S. B.; Lee, H. K.; Kim, T. W. J. Appl. Phys. 1994, 76 (3), 1959-1961.
-
(1994)
J. Appl. Phys.
, vol.76
, Issue.3
, pp. 1959-1961
-
-
Oh, Y.T.1
Byun, S.C.2
Lee, B.R.3
Kang, T.W.4
Hong, C.Y.5
Park, S.B.6
Lee, H.K.7
Kim, T.W.8
-
3
-
-
21544457268
-
-
Sandroff, C. J.; Hegde, M. S.; Farrow, L. A.; Bhat, R.; Harbison, J. P.; Chang, C. C. J. Appl. Phys. 1990, 67 (1), 586-588.
-
(1990)
J. Appl. Phys.
, vol.67
, Issue.1
, pp. 586-588
-
-
Sandroff, C.J.1
Hegde, M.S.2
Farrow, L.A.3
Bhat, R.4
Harbison, J.P.5
Chang, C.C.6
-
4
-
-
0043168746
-
-
Manorama, V.; Bhoraskar, S. V.; Rao, V. J.; Kshirsagar, S. T. Appl. Phys. Lett. 1989, 55 (16), 1641-1643.
-
(1989)
Appl. Phys. Lett.
, vol.55
, Issue.16
, pp. 1641-1643
-
-
Manorama, V.1
Bhoraskar, S.V.2
Rao, V.J.3
Kshirsagar, S.T.4
-
5
-
-
0038424140
-
-
Wilmsen, C. W.; Kirchner, P. D.; Woodall, J. M. J. Appl. Phys. 1988, 64, 3287-3289.
-
(1988)
J. Appl. Phys.
, vol.64
, pp. 3287-3289
-
-
Wilmsen, C.W.1
Kirchner, P.D.2
Woodall, J.M.3
-
7
-
-
2842606447
-
-
Marvin, D. C.; Moss, S. C.; Halle, L. F. J. Appl Phys. 1992, 72, 1970.
-
(1992)
J. Appl Phys.
, vol.72
, pp. 1970
-
-
Marvin, D.C.1
Moss, S.C.2
Halle, L.F.3
-
9
-
-
0028436480
-
-
Mao, D.; Kim, Kang-J.; Frank, A. J. J. Electrochem. Soc. 1994, 141, 1231.
-
(1994)
J. Electrochem. Soc.
, vol.141
, pp. 1231
-
-
Mao, D.1
Kim, K.-J.2
Frank, A.J.3
-
10
-
-
0343420581
-
-
Tufts, B. J.; Casagrande, L. G.; Lewis, N. S.; Grunthaner, F. J. Appl. Phys. Lett. 1990, 57, 1242.
-
(1990)
Appl. Phys. Lett.
, vol.57
, pp. 1242
-
-
Tufts, B.J.1
Casagrande, L.G.2
Lewis, N.S.3
Grunthaner, F.J.4
-
12
-
-
0024280231
-
-
Lunt, S. R.; Casagrande, L. G.; Tufts, B. J.; Lewis, N. S. J. Phys. Chem. 1988, 92, 5766.
-
(1988)
J. Phys. Chem.
, vol.92
, pp. 5766
-
-
Lunt, S.R.1
Casagrande, L.G.2
Tufts, B.J.3
Lewis, N.S.4
-
14
-
-
11644287021
-
-
Wada, Y.; Wada, K. J. Vac. Sci. Technol., B 1993, 11 (4), 1598-1602.
-
(1993)
J. Vac. Sci. Technol., B
, vol.11
, Issue.4
, pp. 1598-1602
-
-
Wada, Y.1
Wada, K.2
-
15
-
-
0022664896
-
-
Offsey, S. D.; Woodall, J. M.; Warren, A. C.; Kirchner, P. D.; Chappell, T. I.; Pettit, G. D. Appl. Phys. Lett. 1986, 48, 475-477.
-
(1986)
Appl. Phys. Lett.
, vol.48
, pp. 475-477
-
-
Offsey, S.D.1
Woodall, J.M.2
Warren, A.C.3
Kirchner, P.D.4
Chappell, T.I.5
Pettit, G.D.6
-
16
-
-
0000650812
-
-
Yablonovitch, E.; Skromme, B. J.; Bhat, R.; Harbison, J. P.; Gmitter, T. J. Appl. Phys. Lett. 1989, 54, 555-557.
-
(1989)
Appl. Phys. Lett.
, vol.54
, pp. 555-557
-
-
Yablonovitch, E.1
Skromme, B.J.2
Bhat, R.3
Harbison, J.P.4
Gmitter, T.J.5
-
20
-
-
0001672424
-
-
Hoffman, C. A.; Jarasiunas, K.; Gerritsen, H. J.; Nurmikko, A. V. Appl. Phys. Lett. 1978, 33, 536.
-
(1978)
Appl. Phys. Lett.
, vol.33
, pp. 536
-
-
Hoffman, C.A.1
Jarasiunas, K.2
Gerritsen, H.J.3
Nurmikko, A.V.4
-
21
-
-
0242496608
-
-
Ando, K.; Yamamoto, A.; Yamaguchi, M. J. Appl. Phys. 1980, 51, 6432.
-
(1980)
J. Appl. Phys.
, vol.51
, pp. 6432
-
-
Ando, K.1
Yamamoto, A.2
Yamaguchi, M.3
-
23
-
-
0344001201
-
-
Kauffman, J. F.; Balko, B. A.; Richmond, G. L. J. Phys. Chem. 1992, 96, 6371.
-
(1992)
J. Phys. Chem.
, vol.96
, pp. 6371
-
-
Kauffman, J.F.1
Balko, B.A.2
Richmond, G.L.3
-
24
-
-
0343564965
-
-
Kauffman, J. F.; Balko, B. A.; Richmond, G. L. J. Phys. Chem. 1992, 96, 6374.
-
(1992)
J. Phys. Chem.
, vol.96
, pp. 6374
-
-
Kauffman, J.F.1
Balko, B.A.2
Richmond, G.L.3
-
25
-
-
0024753316
-
-
Smandek, B.; Chmiel, G.; Gerischer, H. Ber. Bunsen-Ges. Phys. Chem. 1989, 93, 1094-1103.
-
(1989)
Ber. Bunsen-Ges. Phys. Chem.
, vol.93
, pp. 1094-1103
-
-
Smandek, B.1
Chmiel, G.2
Gerischer, H.3
-
27
-
-
0027239368
-
-
Sawada, T.; Numata, K.; Tohdoh, S.; Saitoh, T.; Hasegawa, H. Jpn. J. Appl. Phys., Part 1 1993, 32 (1B), 511-517.
-
(1993)
Jpn. J. Appl. Phys., Part 1
, vol.32
, Issue.1 B
, pp. 511-517
-
-
Sawada, T.1
Numata, K.2
Tohdoh, S.3
Saitoh, T.4
Hasegawa, H.5
-
29
-
-
0001338059
-
-
Kruger, O.; Jung, C.; Gajewski, H. J. Phys. Chem. 1994, 98, 12653.
-
(1994)
J. Phys. Chem.
, vol.98
, pp. 12653
-
-
Kruger, O.1
Jung, C.2
Gajewski, H.3
-
30
-
-
0000316864
-
-
Kruger, O.; Jung, C.; Gajewski, H. J. Phys. Chem. 1994, 98, 12663.
-
(1994)
J. Phys. Chem.
, vol.98
, pp. 12663
-
-
Kruger, O.1
Jung, C.2
Gajewski, H.3
-
33
-
-
5244273158
-
-
Bensaid, B.; Raymond, F.; Leroux, M.; Verie, C.; Fofana, B. J. Appl. Phys. 1989, 66, 5542.
-
(1989)
J. Appl. Phys.
, vol.66
, pp. 5542
-
-
Bensaid, B.1
Raymond, F.2
Leroux, M.3
Verie, C.4
Fofana, B.5
-
35
-
-
11644265371
-
-
note
-
This integral is solved by expressing the complementary error function explicitly and inverting the order of integration.
-
-
-
-
36
-
-
36549104547
-
-
Yablonovitch, E.; Sandroff, C. J.; Bhat, R.; Gmitter, T. Appl. Phys. Lett. 1987, 51, 439.
-
(1987)
Appl. Phys. Lett.
, vol.51
, pp. 439
-
-
Yablonovitch, E.1
Sandroff, C.J.2
Bhat, R.3
Gmitter, T.4
-
39
-
-
11644298143
-
-
manuscript in preparation
-
Liu, C.; Kauffman, J. F., manuscript in preparation. We have examined this effect in real time following step function excitation and observe an exponential decrease in PL intensity which approaches a new steady-state intensity. We have modeled the behavior extensively with the heat equation and have shown that the exponential decay constant and the magnitude of the PL change depend on the rate of heat transfer across the GaAs-heat sink interface. When the rate of heat delivery due to photoexcitation is small compared with that of interfacial heat transfer, sample heating does not occur. Apparently, in the present sample this does not hold when the excitation power exceeds 200 mW.
-
-
-
Liu, C.1
Kauffman, J.F.2
|