Boron contaminations and their kinetics in Ni3(Si,Ti) alloys

Intermetallics

Volumn 6, Issue 5, 1998, Pages 369-377

  Takasugi, T ^a,b   Liu, C T ^a   Heatherly, L ^a   Lee, E H ^a   George, E P ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

A. Silicides, various; B. Diffusion; C. Interstitial content, control; D. Grain boundaries, structure; F. Electron microprobe

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; BORON; CONTAMINATION; DOPING (ADDITIVES); GRAIN BOUNDARIES; VACUUM;

CROSS-ANNEALING;

NICKEL ALLOYS;

EID: 0032131875     PISSN: 09669795     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0966-9795(97)00083-6     Document Type: Article

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